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Gregg Gallatin
Gregg Gallatin
Applied Math Solutions, LLC
Verified email at appliedmathsolutions.com
Title
Cited by
Cited by
Year
Resist blur and line edge roughness
GM Gallatin
Optical Microlithography XVIII 5754, 38-52, 2005
3692005
Ranging and velocimetry signal generation in a backscatter-modulated laser diode
PJ de Groot, GM Gallatin, SH Macomber
Applied optics 27 (21), 4475-4480, 1988
3051988
Nanomanufacturing: a perspective
JA Liddle, GM Gallatin
ACS nano 10 (3), 2995-3014, 2016
2402016
Hybrid illumination system for use in photolithography
S Stanton, G Gallatin, M Oskotsky, F Zernike
US Patent 5,631,721, 1997
1271997
Lithography, metrology and nanomanufacturing
JA Liddle, GM Gallatin
Nanoscale 3 (7), 2679-2688, 2011
1112011
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
DL Goldfarb, AP Mahorowala, GM Gallatin, KE Petrillo, K Temple, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
1102004
Laser focusing of atomic beams
GM Gallatin, PL Gould
JOSA B 8 (3), 502-508, 1991
1081991
Interferometer and method for measuring characteristics of optically unresolved surface features
P De Groot, MJ Darwin, RT Stoner, GM Gallatin, XC De Lega
US Patent 7,324,214, 2008
1062008
Surface‐emitting distributed feedback semiconductor laser
SH Macomber, JS Mott, RJ Noll, GM Gallatin, EJ Gratrix, SL O’Dwyer, ...
Applied physics letters 51 (7), 472-474, 1987
961987
Extendibility of chemically amplified resists: another brick wall?
WD Hinsberg, FA Houle, MI Sanchez, JA Hoffnagle, GM Wallraff, ...
Advances in Resist Technology and Processing XX 5039, 1-14, 2003
912003
Fast model-based optical proximity correction
AE Rosenbluth, GM Gallatin, RL Gordon, N Seong, AY Lvov, ...
US Patent 7,079,223, 2006
902006
Off axis alignment system for scanning photolithography
D Angeley, S Drazkiewicz, G Gallatin
US Patent 5,477,057, 1995
891995
Resolution, LER, and sensitivity limitations of photoresists
GM Gallatin, P Naulleau, D Niakoula, R Brainard, E Hassanein, R Matyi, ...
Emerging Lithographic Technologies XII 6921, 417-427, 2008
842008
Printability verification by progressive modeling accuracy
GM Gallatin, K Lai, M Mukherjee, AE Rosenbluth
US Patent 7,512,927, 2009
832009
Fundamental limits to EUV photoresist
GM Gallatin, P Naulleau, R Brainard
Advances in Resist Materials and Processing Technology XXIV 6519, 387-396, 2007
812007
Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization
PP Naulleau, GM Gallatin
Applied Optics 42 (17), 3390-3397, 2003
792003
Backscatter-modulation velocimetry with an external-cavity laser diode
PJ De Groot, GM Gallatin
Optics letters 14 (3), 165-167, 1989
751989
Mask and wafer diffraction grating alignment system wherein the diffracted light beams return substantially along an incident angle
GM Gallatin, JL Kreuzer, ML Nelson
US Patent 5,559,601, 1996
661996
Nanomanufacturing with DNA origami: factors affecting the kinetics and yield of quantum dot binding
SH Ko, GM Gallatin, JA Liddle
Advanced Functional Materials 22 (5), 1015-1023, 2012
652012
Propagation of vortex electron wave functions in a magnetic field
GM Gallatin, B McMorran
Physical Review A—Atomic, Molecular, and Optical Physics 86 (1), 012701, 2012
612012
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