Harm Knoops
Harm Knoops
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Plasma atomic layer deposition
HCM Knoops, K De Peuter, WMM Kessels
US Patent 9,637,823, 2017
In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition
E Langereis, SBS Heil, HCM Knoops, W Keuning, MCM Van De Sanden, ...
Journal of Physics D: Applied Physics 42 (7), 073001, 2009
Conformality of plasma-assisted ALD: physical processes and modeling
HCM Knoops, E Langereis, MCM Van De Sanden, WMM Kessels
Journal of The Electrochemical Society 157 (12), G241, 2010
Status and prospects of plasma-assisted atomic layer deposition
H Knoops, T Faraz, K Arts, WMM Kessels
Journal of Vacuum Science & Technology A 37 (3), 2019
Atomic layer etching: What can we learn from atomic layer deposition?
T Faraz, F Roozeboom, HCM Knoops, WMM Kessels
ECS Journal of Solid State Science and Technology 4 (6), N5023, 2015
Remote plasma ALD of platinum and platinum oxide films
HCM Knoops, AJM Mackus, ME Donders, MCM Van De Sanden, ...
Electrochemical and Solid-State Letters 12 (7), G34, 2009
Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
WMM Kessels, HCM Knoops, SAF Dielissen, AJM Mackus, ...
Applied Physics Letters 95 (1), 2009
Atomic layer deposition for nanostructured Li-ion batteries
HCM Knoops, ME Donders, MCM Van de Sanden, PHL Notten, ...
Journal of Vacuum Science & Technology A 30 (1), 2012
Atomic layer deposition
HCM Knoops, SE Potts, AA Bol, WMM Kessels
Handbook of Crystal Growth, 1101-1134, 2015
Atomic layer deposition of LiCoO2 thin-film electrodes for all-solid-state Li-ion micro-batteries
ME Donders, WM Arnoldbik, HCM Knoops, WMM Kessels, PHL Notten
Journal of the Electrochemical Society 160 (5), A3066, 2013
Deposition of TiN and TaN by remote plasma ALD for Cu and Li diffusion barrier applications
HCM Knoops, L Baggetto, E Langereis, MCM Van De Sanden, ...
Journal of the Electrochemical Society 155 (12), G287, 2008
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS 2: large area, thickness control and tuneable morphology
A Sharma, MA Verheijen, L Wu, S Karwal, V Vandalon, HCM Knoops, ...
Nanoscale 10 (18), 8615-8627, 2018
Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
HCM Knoops, EMJ Braeken, K de Peuter, SE Potts, S Haukka, V Pore, ...
ACS applied materials & interfaces 7 (35), 19857-19862, 2015
Tuning material properties of oxides and nitrides by substrate biasing during plasma-enhanced atomic layer deposition on planar and 3D substrate topographies
T Faraz, HCM Knoops, MA Verheijen, CAA Van Helvoirt, S Karwal, ...
ACS applied materials & interfaces 10 (15), 13158-13180, 2018
Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
E Langereis, HCM Knoops, AJM Mackus, F Roozeboom, ...
Journal of Applied Physics 102 (8), 2007
Remote plasma atomic layer deposition of Co3O4 thin films
ME Donders, HCM Knoops, WMM Kessels, PHL Notten
Journal of The Electrochemical Society 158 (4), G92, 2011
Enhanced doping efficiency of Al-doped ZnO by atomic layer deposition using dimethylaluminum isopropoxide as an alternative aluminum precursor
Y Wu, SE Potts, PM Hermkens, HCM Knoops, F Roozeboom, ...
Chemistry of Materials 25 (22), 4619-4622, 2013
Low-temperature plasma-assisted atomic layer deposition of silicon nitride moisture permeation barrier layers
AM Andringa, A Perrotta, K de Peuter, HCM Knoops, WMM Kessels, ...
ACS applied materials & interfaces 7 (40), 22525-22532, 2015
Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
AJM Mackus, SBS Heil, E Langereis, HCM Knoops, MCM Van de Sanden, ...
Journal of Vacuum Science & Technology A 28 (1), 77-87, 2010
Electron Scattering and Doping Mechanisms in Solid-Phase-Crystallized In2O3:H Prepared by Atomic Layer Deposition
B Macco, HCM Knoops, WMM Kessels
ACS applied materials & interfaces 7 (30), 16723-16729, 2015
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