Vitor Manfrinato
Vitor Manfrinato
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Anisotropic etching and nanoribbon formation in single-layer graphene
LC Campos*, VR Manfrinato*, JD Sanchez-Yamagishi, J Kong, ...
Nano Letters 9 (7), 2600–2604, 2009
Resolution Limits of Electron-Beam Lithography toward the Atomic Scale
VR Manfrinato, L Zhang, D Su, H Duan, R Hobbs, EA Stach, K Berggren
Nano Letters, 2013
Sub-10-nm half-pitch electron-beam lithography by using poly (methyl methacrylate) as a negative resist
H Duan, D Winston, JKW Yang, BM Cord, VR Manfrinato, KK Berggren
Journal of Vacuum Science & Technology B 28 (6), C6C58-C6C62, 2010
Designs for a quantum electron microscope
P Kruit, RG Hobbs, CS Kim, Y Yang, VR Manfrinato, J Hammer, S Thomas, ...
Ultramicroscopy 164, 31-45, 2016
Aberration-corrected electron beam lithography at the one nanometer length scale
VR Manfrinato, A Stein, L Zhang, CY Nam, KG Yager, EA Stach, CT Black
Nano letters 17 (8), 4562-4567, 2017
Determining the resolution limits of electron-beam lithography: direct measurement of the point-spread function
VR Manfrinato, J Wen, L Zhang, Y Yang, RG Hobbs, B Baker, D Su, ...
Nano letters 14 (8), 4406-4412, 2014
Neon ion beam lithography (NIBL)
D Winston*, VR Manfrinato*, SM Nicaise*, LL Cheong*, H Duan, ...
Nano letters 11 (10), 4343-4347, 2011
Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale
H Duan, VR Manfrinato, JKW Yang, D Winston, BM Cord, KK Berggren
Journal of Vacuum Science & Technology B 28 (6), C6H11-C6H17, 2010
Patterning Si at the 1 nm length scale with aberration‐corrected electron‐beam lithography: tuning of plasmonic properties by design
VR Manfrinato, FE Camino, A Stein, L Zhang, M Lu, EA Stach, CT Black
Advanced Functional Materials 29 (52), 1903429, 2019
High-energy surface and volume plasmons in nanopatterned sub-10-nm aluminum nanostructures
RG Hobbs*, VR Manfrinato*, Y Yang*, SA Goodman*, L Zhang, EA Stach, ...
Nano Letters, 2016
Sub-5keV electron-beam lithography in hydrogen silsesquioxane resist
VR Manfrinato, LL Cheong, H Duan, D Winston, HI Smith, KK Berggren
Microelectronic Engineering 88 (10), 3070-3074, 2011
Controlled placement of colloidal quantum dots in sub-15 nm clusters
VR Manfrinato, DD Wanger, DB Strasfeld, HS Han, F Marsili, JP Arrieta, ...
Nanotechnology 24 (12), 125302, 2013
Superconducting nanowire single photon detector and method of fabrication thereof
CJ Chung, F Najafi, G Kovall, VR Manfrinato, V Kamineni, M Thompson, ...
US Patent 11,009,387, 2021
Focused-helium-ion-beam blow forming of nanostructures: radiation damage and nanofabrication
CS Kim, RG Hobbs, A Agarwal, Y Yang, VR Manfrinato, MP Short, J Li, ...
Nanotechnology 31 (4), 045302, 2019
Tapered connectors for superconductor circuits
F Najafi, VR Manfrinato
US Patent 11,101,215, 2021
Electrochemical development of hydrogen silsesquioxane by applying an electrical potential
S Strobel, KJ Harry, H Duan, JKW Yang, VR Manfrinato, KK Berggren
Nanotechnology 22 (37), 375301, 2011
Single-digit nanometer electron-beam lithography with an aberration-corrected scanning transmission electron microscope
FE Camino, VR Manfrinato, A Stein, L Zhang, M Lu, EA Stach, CT Black
JoVE (Journal of Visualized Experiments), e58272, 2018
The Orientations of Large Aspect‐Ratio Coiled‐Coil Proteins Attached to Gold Nanostructures
JB Chang, YH Kim, E Thompson, YH No, NH Kim, J Arrieta, ...
Small 12 (11), 1498-1505, 2016
Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots
VR Manfrinato
Massachusetts Institute of Technology, 2011
1‐nm Si Patterning: Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design (Adv. Funct. Mater. 52 …
VR Manfrinato, FE Camino, A Stein, L Zhang, M Lu, EA Stach, CT Black
Advanced Functional Materials 29 (52), 1970353, 2019
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