Ruben Maas
Ruben Maas
ASML Research
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Cited by
Cited by
Experimental realization of an epsilon-near-zero metamaterial at visible wavelengths
R Maas, J Parsons, N Engheta, A Polman
Nature Photonics 7 (11), 907-912, 2013
High-NA EUV lithography exposure tool: advantages and program progress
J Van Schoot, S Lok, E van Setten, R Maas, K Troost, R Peeters, J Finders, ...
Extreme Ultraviolet Lithography 2020 11517, 76-89, 2021
Negative refractive index and higher-order harmonics in layered metallodielectric optical metamaterials
R Maas, E Verhagen, J Parsons, A Polman
Acs Photonics 1 (8), 670-676, 2014
Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists
R Maas, MC van Lare, G Rispens, SF Wuister
Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (4), 041003-041003, 2018
Planar metal/dielectric single-periodic multilayer ultraviolet flat lens
R Maas, J van de Groep, A Polman
Optica 3 (6), 592-596, 2016
Experimental realization of a polarization-independent ultraviolet/visible coaxial plasmonic metamaterial
MA Van de Haar, R Maas, H Schokker, A Polman
Nano letters 14 (11), 6356-6360, 2014
High-NA EUVL exposure tool: key advantages and program status
J Van Schoot, S Lok, E van Setten, R Maas, R Peeters, J Finders, ...
International Conference on Extreme Ultraviolet Lithography 2021 11854, 1185403, 2021
Generalized antireflection coatings for complex bulk metamaterials
R Maas, SA Mann, DL Sounas, A Alu, EC Garnett, A Polman
Physical Review B 93 (19), 195433, 2016
Analyze line roughness sources using power spectral density (PSD)
L Pu, T Wang, TJ Huisman, R Maas, M Goosen, H Dillen, P Leray, W Fang
Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019
Method for determining defectiveness of pattern based on after development image
M Kooiman, M Pisarenco, A Slachter, MJ Maslow, BAO RIVERA, WT Tel, ...
US Patent App. 17/640,792, 2022
Surface plasmon polariton modes in coaxial metal-dielectric-metal waveguides
MA Van de Haar, R Maas, B Brenny, A Polman
New Journal of Physics 18 (4), 043016, 2016
Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography
A Langner, Y Ekinci, R Gronheid, S Wang, E van Setten, ...
International Symposium on Extreme Ultraviolet Lithography 1, 2010
Particle beam apparatus, defect repair method, lithographic exposure process and lithographic system
RC Maas, AO Polyakov, TJ Coenen
US Patent 11,996,267, 2024
Predictive compact model for stress-induced on-product overlay correction
H Zhang, C Tabery, R Maas, O Khodko, VM Blanco Carballo, E Canga, ...
Journal of Micro/Nanopatterning, Materials, and Metrology 21 (4), 043201-043201, 2022
Method of metrology and associated apparatuses
TJ Huisman, RC Maas, HA Dillen
US Patent 11,112,703, 2021
Holistic assessment and control of total CDU
J Finders, V Vaenkatesan, L van Kessel, R Maas, T van Rhee, V Kakkar, ...
Optical and EUV Nanolithography XXXVII 12953, 15-27, 2024
Method of metrology and associated apparatuses
TJ Huisman, RC Maas, HA Dillen
US Patent 11,733,614, 2023
J van Schoot, S Lok, E van Setten, R Maas, K Troost, R Peeters, J Finders, ...
Method and apparatus for forming a patterned layer of material
PWH De Jager, SF Wuister, VAN Marie-Claire, RC Maas, AO Polyakov, ...
US Patent App. 16/971,012, 2021
Light propagation in multilayer metamaterials
RC Maas
Universiteit van Amsterdam [Host], 2015
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